| No. | Presenter | Title | Institute/Company |
| 1 | Zabrodskii V V | Silicon avalanche photodiode photon detection efficiency in the wavelength range of 114 - 170 nm | Ioffe |
| 2 | Mahmoud A | Highly efficient SiC/Mo/Al multilayer gratings for EUV applications | CNRS-IO |
| 3 | Liu Y | EUV in-plane diffraction characterization of quasi-periodic nanoripples produced by ion beam sputtering | NSRL |
| 4 | Ravinet N | Development and characterization of W/SiC aperiodic multilayer coatings for hard X-rays | CNRS-IO |
| 5 | Akhmetov F | Modeling of XUV-induced electron emission in ultrathin semiconductor films | MESA+ |
| 6 | Sokolov A | Highly efficient multilayer-coated blazed gratings for tender X-ray energy range | HZB |
| 7 | Sertsu M G | Optical constants of beryllium thin layers determined from Mo/Be multilayers in spectral range 90 to 134 eV | Rigaku |
| 8 | Smekhova A | Materials Metrology at synchrotrons and its extension to X-ray lab sources | HZB |
| 9 | Kirschner H | Extension of photoemission tomography to atomic photoionization | PTB |
| 10 | IJpes D | X-ray standing wave study of barrier layers in ultrashort period multilayers | University of Twente |
| 11 | Borgwardt M | High-precision high-load manipulator for EUV reflectometry | Bestec GmbH |
| 12 | Di Qu | Laser-Induced XUV Spectroscopy (LIXS) for High-Precision Lithium Analysis of Energy Materials | EMPA |
| 13 | Hemani Y | Development of a Table-top X-ray Laser for 24/7 Advanced Spectroscopy (EMPULSE) | EMPA |
| 14 | Matveevskii K | Characterization of strong metal-support interaction using X-ray standing wave technique | MESA+ |
| 15 | Fatuzzo CG | TXRF/GIXRF high precision laboratory setup with high flux monochromatic source | CNR |
| 16 | Kolbe M | HC free big reflectometer for metrology applications and EUV inspectometer for spatialy resolved reflectivity at the EUVR beamline of the MLS | PTB |
| 17 | Fiedorowicz H | A desktop EUV microscope based on a compact laser-plasma light source with a gas puff target | WAT |
| 18 | Arikkatt AJ | Laboratory system for optical coherence tomography (OCT) using a laser plasma source of soft x-rays and extreme ultraviolet and focusing ellipsoidal optics | WAT |
| 19 | Majszyk M | Laser plasma based source system for testing of VUV optical elements | WAT |
| 20 | Lohr L | Geometry reconstruction of nanostructures using X-ray scattering and fluorescence measurements | PTB |
