8:30 | | Registration & Poster Set-up & Morning Coffee | |
9:30 | | Opening : Recent Developments in VUV and EUV Metrology at PTB | |
10:00 | van de Kerkhof M | Keynote: EUV Lithography: present and future | ASML |
| | Short Break | |
10:50 | | Session I | Chair: Scholze |
10:50 | Philipsen V | Engineering novel EUV mask absorbers at imec | IMEC |
11:10 | Vieker J | Irradiation systems for accelerated testing of EUVL components | Fraunhofer ILT |
11:30 | Ramankutty S V | A novel sensor for measuring hydrogen radical recombination rates | TNO |
11:50 | Gissot S | Performance of the Extreme Ultraviolet Imager (EUI) High-Resolution Imager (HRI-EUV) telescope: from ground calibration to first in-flight images, and future | ROB |
12:10 | | Conference photo | |
12:20 | | Lunch Break | |
13:00 | | Poster & Sponsor Presentation | |
14:50 | | Session II | Chair: Gottwald |
14:50 | Tiedtke K | FLASH2020+ project: New challenges for photon diagnostics | DESY |
15:10 | Ivanov R | Temporal characterization of SASE XUV FEL pulses at FLASH | DESY |
15:30 | Feikes J | Steady-State Microbunching experiment at the Metrology Light Source – Recent Progress | HZB |
15:50 | | Coffee Break | |
16:20 | | Session III | Chair: Scholze |
16:20 | Szeghalmi A | Optical Properties of SiO2:HfO2 PEALD Composites for Functional Coatings | Fraunhofer IOF |
16:40 | Larruquert J I | Al/fluoride mirrors with enhanced far UV reflectance | CSIC |
17:00 | López-Reyes P | High reflectance FUV narrowband mirrors | CSIC |
17:20 | Farchmin N | Traceable metrology of soft X-ray to IR optical constants | PTB |
17:40 | | End of Sessions | |
18:00 | | Get Together Reception and Buffet Dinner | |
21:00 | | End of Day 1 | |